Películas delgadas de CNx formadas por PLD a diferentes temperaturas

carbon nitride (cnx) thin films were grown by pulsed laser deposition using a nd:yag laser (1064 nm, 500mj), in a graphite target (99.999%) on si(100) substrate for three different temperatures 21, 50 and 200 °c, in a nitrogen atmosphere at constant pressure of 2,66 pa. the ftir's analysis made to the films, revealed the presence of active modes around 1108 cm-1, 1465 cm-1, 2270 cm-1, associated with the simple, double and triple bonding of cn, respectively. chemical composition was studied by edx analysis, low nitrogen contents were found between 3 and 6 at%. and the mechanical properties of the films were evaluated using nanoindentation technique. the highest hardness was 14 gpa at 200°c substrate temperature.