%0 Journal Article
%T Pel¨ªculas delgadas de CNx formadas por PLD a diferentes temperaturas
%A Gallego Cano
%A Jorge Luis
%A Ram¨ªrez Vinasco
%A Deisy
%A Riascos Land¨¢zuri
%A Henry
%A Ipaz
%A Leonid
%A Mu£¿oz Salda£¿a
%A Juan
%J Ingenier¨ªa y Desarrollo
%D 2011
%I Universidad del Norte
%X carbon nitride (cnx) thin films were grown by pulsed laser deposition using a nd:yag laser (1064 nm, 500mj), in a graphite target (99.999%) on si(100) substrate for three different temperatures 21, 50 and 200 ¡ãc, in a nitrogen atmosphere at constant pressure of 2,66 pa. the ftir's analysis made to the films, revealed the presence of active modes around 1108 cm-1, 1465 cm-1, 2270 cm-1, associated with the simple, double and triple bonding of cn, respectively. chemical composition was studied by edx analysis, low nitrogen contents were found between 3 and 6 at%. and the mechanical properties of the films were evaluated using nanoindentation technique. the highest hardness was 14 gpa at 200¡ãc substrate temperature.
%K carbon nitride
%K nanoindentation
%K pulsed laser deposition.
%U http://www.scielo.org.co/scielo.php?script=sci_abstract&pid=S0122-34612011000100005&lng=en&nrm=iso&tlng=en