Spray pyrolysis method was used to deposit Lutetium
Oxide (Lu2O3) thin films using lutetium (III)
chloride as source material and water as oxidizer. Annealing was carried out in
argon atmosphere at 450°C for 60 minutes of the films. To investigate the composition and stoichiometry of sprayed as-deposited
and annealed Lu2O3 thin films, depth profile studies using X-ray photoelectron
spectroscopy (XPS) was done. Nearly
stoichiometric was observed for both annealed and as-deposited films in
inner and surface layers.
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