%0 Journal Article
%T Investigation of Sprayed Lu<sub>2</sub>O<sub>3</sub> Thin Films Using XPS
%A Towhid Adnan Chowdhury
%J Advances in Materials Physics and Chemistry
%P 197-205
%@ 2162-5328
%D 2023
%I Scientific Research Publishing
%R 10.4236/ampc.2023.1311014
%X Spr<span>ay pyrolysis method was used to deposit Lutetium
Oxide (Lu<sub>2</sub>O<sub>3</sub>) t</span>hin films using lutetium (III)
chloride as source material and water as oxidizer. Annealing was carried out in
argon atmosphere at 450<span style=\"text-wrap:nowrap;\">กใ</span>C for 60 minutes of the films. <span>To investigate the composition and stoichiometry of sprayed as-deposite</span>d
and annealed Lu<sub>2</sub>O<sub>3</sub> thin films<span style=\"font-family:;\" \"=\"\">,</span><span style=\"font-family:;\" \"=\"\"> depth profile studies using X-ray photoelectron
spec<span>troscopy (XPS) was done. Nearly
stoichiometric was obs</span>erved for both annealed and as-deposited films in
inner and surface layers.</span>
%K Lu&lt
%K sub&gt
%K 2&lt
%K /sub&gt
%K O&lt
%K sub&gt
%K 3&lt
%K /sub&gt
%K Depth Profiling
%K X-Ray Photoelectron Spectroscopy
%K Thin Films
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=129378