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- 2018
Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film TransistorsDOI: 10.1186/s11671-017-2414-0 Keywords: Atomic layer deposition, Low deposition temperature, In2O3, Thin-film transistors Abstract: a Growth rate of ALD In2O3 film on the Si substrate as a function of substrate temperature, and b dependence of the In2O3 film thickness on the number of ALD cycles at 160 °
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