%0 Journal Article
%T Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
%A Bao Zhu
%A David Wei Zhang
%A He-Mei Zheng
%A Qian Ma
%A Shi-Jin Ding
%A Wen-Jun Liu
%A Yan Shao
%J Archive of "Nanoscale Research Letters".
%D 2018
%R 10.1186/s11671-017-2414-0
%X a Growth rate of ALD In2O3 film on the Si substrate as a function of substrate temperature, and b dependence of the In2O3 film thickness on the number of ALD cycles at 160 กใ
%K Atomic layer deposition
%K Low deposition temperature
%K In2O3
%K Thin-film transistors
%U https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5760491/