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- 2018
A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVDDOI: 10.1186/s11671-018-2641-z Keywords: Hydrogenated nanocrystalline silicon, PECVD, Deposition pressure, Ion bombardment, Defect density Abstract: The online version of this article (10.1186/s11671-018-2641-z) contains supplementary material, which is available to authorized users
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