%0 Journal Article
%T A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD
%A Hong Liu
%A Wenzhong Shen
%A Yuwei Wang
%J Archive of "Nanoscale Research Letters".
%D 2018
%R 10.1186/s11671-018-2641-z
%X The online version of this article (10.1186/s11671-018-2641-z) contains supplementary material, which is available to authorized users
%K Hydrogenated nanocrystalline silicon
%K PECVD
%K Deposition pressure
%K Ion bombardment
%K Defect density
%U https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6086780/