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- 2018
Thickness Dependence on Interfacial and Electrical Properties in Atomic Layer Deposited AlN on c-plane GaNDOI: 10.1186/s11671-018-2645-8 Keywords: Atomic layer deposited AlN, Interface state density, Reverse leakage current Abstract: Cross-sectional scanning transmission electron microscopy (STEM) images with a 0.7-, b 1.5-, and c 7.4-nm-thick AlN. d, e Atomic percent vs. depth profiles obtained from energy dispersive X-ray spectroscopy (EDS) line scans for the samples with 0- and 7.4-nm-thick AlN, respectivel
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