|
- 2016
考虑可移动电荷的双栅隧穿场效应晶体管电流模型
|
Abstract:
为了解决隧穿场效应晶体管(TFET)在强反型区表面势和漏电流精度下降的问题,建立了一种考虑可移动电荷影响的双栅TFET电流模型。首先求解考虑可移动电荷贡献的二维电势泊松方程,推导出表面势、电场的解析表达式;然后利用求得的电场表达式和Kane模型得到载流子的隧穿产生率;最后利用切线近似法计算隧穿产生率在隧穿区域的积分,建立了漏电流的简洁解析模型。利用器件数值仿真软件Sentaurus在不同器件参数下对所建模型进行了验证,仿真结果表明:考虑可移动电荷的影响能够提高强反型区漏电流模型的精度;在相同器件参数条件下,考虑可移动电荷的模型比忽略可移动电荷的模型精度提高了20%以上。
An analytical drain current model considering mobile charges for double??gate tunneling field effect transistor is proposed to solve the problem that the precision of surface potential and drain current of the tunneling field effect transistor (TFET) declines in strong inversion regions. Firstly, the 2??D potential Poisson’s equation is solved by taking the contribution of mobile charges into account to get the analytical expressions of the surface potential and the electric field. Then the electric field distribution and Kane model are used to get the generation rate of the carriers. Finally a compact analytical drain current model is derived by using the tangent line approximation method to calculate the integration of the tunneling generation rate in the tunneling region. The analytical model is verified by using the device numerical simulation software Sentaurus under different device parameters. Simulation results show that considering the mobile charges improves the precision of the drain current model in strong inversion regions. Comparisons with the models without considering the mobile charges show that the precision of the model considering the mobile charges is improved by more than 20%
[1] | [6]VISHNOI R, KUMAR M J. An accurate compact analytical model for the drain current of a TFET from subthreshold to strong inversion [J]. IEEE Transactions on Electron Devices, 2015, 62(2): 478??484. |
[2] | [13]VERHULST A S, LEONELLI D, ROOYACKERS R, et al. Drain voltage dependent analytical model of tunnel field effect transistors [J]. Journal of Applied Physics, 2011, 110(2): 024510. |
[3] | [15]韩忠方. 隧穿晶体管的模拟研究 [D]. 上海: 复旦大学, 2012. |
[4] | [16]CHO E N, SHIN Y H, YUN L. Channel doping??dependent analytical model for symmetric double gate metal??oxide??semiconductor field??effect transistor: IIContinuous drain current model from subthreshold to inversion region [J]. Journal of Applied Physics, 2013, 113(21): 214507. |
[5] | [17]QIANG C, EVANS M H, JAMES D M. A physical short channel threshold voltage model for undoped symmetric double??gate MOSFETs [J]. IEEE Transactions on Electron Devices, 2003, 50(7): 1631??1637. |
[6] | [18]TAUR Y, LIANG X, WANG W, et al. A continuous, analytic drain current model for DG MOSFETs [J]. IEEE Electron Device Letter, 2004, 25(2): 107??109. |
[7] | [19]KANE E O. Theory of tunneling [J]. Journal of Applied Physics, 1961, 32(1): 83??91. |
[8] | [21]LI Zunchao, ZHANG Ruizhi, LIANG Feng, et al. Analytical and numerical study of the impact of HALOs on surrounding??gate MOSFETs [J]. IEICE Transactionson Electronics, 2009, 92(4): 558??563. |
[9] | HAN Mingjun, KE Daoming, CHI Xiaoli, et al. A two??dimensional semi??analytical potential model for ultra short channel. [J]. Journal of Physics, 2013, 62(9): 1??7. |
[10] | [4]甘学温, 王旭社, 张兴. 双栅和环栅MOSFET中短沟效应引起的阈值电压下降 [J]. 半导体学报, 2001, 22(12): 1581??1585. |
[11] | GAN Xuewen, WANG Xushe, ZHANG Xing. Threshold voltage dropping caused by the short channel effect in double??gate and surrounding??gate MOSFET. [J]. Journal of Semiconductors, 2001, 22(12): 1581??1585. |
[12] | [7]BARDON M G, NEVES H P. Pseudo two dimensional model for double??gate tunnel FETs considering the junctions depletion regions [J]. IEEE Transactions on Electron Devices, 2010, 57(4): 827??834. |
[13] | [8]PANDEY P, RAJAT V, KUMAR M J. A full range dual material gate tunnel field effect transistor drain current model considering both source and drain depletion region band??to??band tunneling [J]. Journal of Computational Electronics, 2015, 14: 280??287. |
[14] | [9]SAMUEL T S A, BALAMURUGAN N B. An analytical modeling and simulation of dual material double gate tunnel field effect transistor for low power applications [J]. Journal of Electrical Engineering & Technology, 2014, 9(1): 247??253. |
[15] | [10]WAN J, ROYER C L, ZASLAVSKY A, et al. A tunneling field effect transistor model combining interband tunneling with channel transport [J]. Journal of Applied Physics, 2011, 110(10): 104503. |
[16] | [1]KOSWATTA S O, LUNDSTROM M S, NIKONOV D E. Performance comparison between p??i??n tunneling transistors and conventional MOSFETs [J]. IEEE Transactions on Electron Devices, 2009, 56(3): 456??465. |
[17] | [2]CHOI W Y, PARK B G, LEE G D, et al. Tunneling field effect transistors (TFETs) with subthreshold swing(SS) less than 60 mV/dec [J]. IEEE Transactions on Electron Devices, 2007, 28(8): 743??745. |
[18] | [3]韩名君, 柯导明, 迟晓丽, 等. 超短沟道电势的二维半解析模型. [J]. 物理学报, 2013, 62(9): 1??7. |
[19] | [5]骆东旭, 李尊朝, 关云鹤, 等. 一种新型GaAs基无漏结隧穿场效应晶体管 [J]. 西安交通大学学报, 2016, 50(2): 68??72. |
[20] | LUO Dongxu, LI Zunchao, GUAN Yunhe, et al. A new type of GaAs base TFET without channel/drain junction. [J]. Journal of Xi’an Jiaotong University, 2016, 50(2): 68??72. |
[21] | [11]GHOLIZADEH M, HOSSEINI S E. A 2??D analytical model for double??gate tunnel FETs [J]. IEEE Transactions on Electron Devices, 2014, 61(5): 1494??1500. |
[22] | [12]PAN A, CHEN S, CHUI C O. Electrostatic modeling and insights regarding multigate lateral tunneling transistors [J]. IEEE Transactions on Electron Devices, 2013, 60(9): 2712??2720. |
[23] | [14]VISHNOI R, KUMAR M J. A compact analytical model for the drain current of gate??all??around nanowire tunnel FET accurate from sub??threshold to on??state [J]. IEEE Transactions on Electron Devices, 2015, 14(2): 358??362. |
[24] | [20]HURKX G A M, KLAASSEN D B M, KNUVERS M P G. A new recombination model for device simulation including tunneling [J]. IEEE Transactions on Electron Devices, 1992, 39(2): 331??338. |