OALib Journal期刊
ISSN: 2333-9721
费用:99美元
|
|
|
原子层淀积al2o3薄膜表面自组装au纳米颗粒及其热稳定性
Keywords: 金属材料,化学自组装生长,au纳米颗粒,热稳定性
Abstract:
?在原子层淀积的al2o3薄膜表面自组装生长au纳米颗粒,研究了au纳米颗粒的自组装过程和热稳定性.结果表明,原子层淀积的al2o3薄膜表面很容易吸附氨丙基三甲基硅烷(aptms),有利于au纳米颗粒的自组装,生长出的au纳米颗粒尺寸为5--8nm,密度约为4×1011cm-2.在300℃氮气中退火使au纳米颗粒的尺寸增大,但是没有改变aptms的吸附状态和au的化学组成.当退火温度提高到450℃时,au纳米颗粒发生明显的团聚,且分布变得极不均匀.
References
[1] | 9c.lee,j.meteer,v.narayanan,e.c.kan,self-assemblyofmetalnanocrystalsonultrathinoxidefornonvolatilememoryapplications,j.electronicmaterials,34(1),1(2005)
|
[2] | 11m.zhang,w.chen,s.j.ding,z.y.liu,y.huang,z.w.liao,d.w.zhang,physicalandelectricalcharacterization
|
[3] | ofatomic-layer-depositedrunanocrystalsembeddedintoal2o3formemoryapplications,j.phys.d,41(3),032007(2007)
|
[4] | 12s.j.huo,q.x.li,y.g.yan,y.chen,w.b.cai,q.j.xu,m.osawa,turnablesurface-enhancedinfraredabsorption
|
[5] | onaunanofilmsonsifabricatedbyself-assemblyandgrowthofcolloidalparticles,j.phy.chem.b,109,
|
[6] | 15985(2005)
|
[7] | 15o.renault,l.g.gosset,d.rouchon,a.ermolieff,angleresolvedx-rayphotoelectronspectroscopyofultrathin
|
[8] | al2o3filmsgrownbyatomiclayerdeposition,j.vac.sci.technol.a,20(6),1867(2002)
|
[9] | 16d.t.zhao,y.zhu,j.l.liu,chargestorageinametal-oxide-semiconductorcapacitorcontainingcobalt
|
[10] | nanocrystals,solid-stateelectronics,50(2),268(2006)
|
[11] | 17p.sangpour,o.akhavan,a.z.moshfegh,m.roozbehi,formationofgoldnanoparticlesinheat-treatedreactive
|
[12] | co-sputteredau-sio2thinfilms,appliedsurfacescience,254(1),286(2007)
|
[13] | 18a.f.wang,h.y.tang,t.cao,invitrostabilitystudyoforganosilaneself-assemblemonolayersandmultilayers,
|
[14] | journalofcolloidandinterfacescience,291(2),438(2005)
|
[15] | 1a.thean,j.p.leburton,flashmemory:towardssingleelectronics,ieeepotentials,21(oct/nov),35(2002)
|
[16] | 2z.liu,c.lee,v.narayanan,g.pei,e.c.kan,metalnanocrystalmemories:devicedesignandfabrication,
|
[17] | ieeetrans.electrondevices,49(9),1606(2002)
|
[18] | 3d.u.lee,m.s.lee,j.h.kim,floatinggatedsilicon-oninsulatornonvolatilememorydeviceswithauanoparticlesembeddedinsio1.3ninsulatorsbydigitalsputteringmethod,appl.phys.lett.,90(9),093514(2007)
|
[19] | 4j.h.kim,k.h.baek,c.k.kim,y.b.kim,c.s.yoon,formationofgoldnanoparticlesembeddedinapolyimidefilm
|
[20] | fornanofloatinggatememory,appl.phys.lett.,90(12),123118(2007)
|
[21] | 5c.c.wang,y.k.chiou,c.h.chang,memorycharacteristicsofaunanocrystalsembeddedinmetal-oxidesemiconductorstructurebyusingatomic-layer-depositedal2o3ascontroloxide,j.ofphys.d,40(6),1673(2007)
|
[22] | 6w.l.leong,p.s.lee,s.g.mhaisalkar,chargingphenomenainpentacene-goldnanoparticlememorydevice,appl.phys.lett.,90(4),042906(2007)
|
[23] | 7r.j.tseng,j.x.huang,j.y.ouyang,r.b.kaner,y.yang,polyanilinenanofiber/goldnanoparticlenonvolatilememory,nanoletters,5(6),1077(2005)
|
[24] | 8w.h.guan,s.b.long,fabricationandchargingcharacteristicsofmoscapacitorstructurewithmetalnanocrystalsembeddedingateoxide,j.phys.d,40(9),2754(2007)
|
[25] | 10j.y.yang,j.h.kim,w.j.choi,y.h.do,c.o.kim,j.p.hong,enhancedelectricalcharacteristicsofau
|
[26] | nanoparticlesembeddedinhigh-khfo2matrix,j.appl.phys.,100(8),066102(2006)
|
[27] | 13m.xu,h.l.lu,s.j.ding,effectoftrimethylaluminiumsurfacepretreatmentonatomiclayerdepositional2o3
|
[28] | ultra-thinfilmonsisubstrate,chin.phys.lett.,22(9),2418(2005)
|
[29] | 14j.hu,w.li,j.chen,novelplatingsolutionforelectrolessdepositionofgoldfilmontoglasssurface,surfaceandcoatingstechnology,202(13),2922(2008)
|
Full-Text
|
|
Contact Us
service@oalib.com QQ:3279437679 
WhatsApp +8615387084133
|
|