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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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fe-ni-n薄膜的结构及磁性
Keywords: fe-ni-n薄膜,结构,磁性,晶粒取向
Abstract:
？用双离子束溅射法在玻璃基片上制得了fe-ni-n薄膜，研究了ni含量、主源气氛及退火温度对fe-ni-n薄膜的结构、磁性及热稳定性的影响，选择合适的工艺条件，可制得在（100）面方向有100%晶粒取向度的单一γ’-(fe,ni)4n相。ni含量为6.7%(摩尔分数)的fe-ni-n薄膜具有较好的软磁性能，其饱和磁化强度ms为2.04t，矫顽力hc为0.68ka/m。但是随着ni含量的提高，fe-ni-n薄膜的热稳定性下降。在主源气压比pn2/par较低时，有利于氮含量较低的γ’相的形成，在较高的pn2/par条件下，则形成氮含量较高的ε-(fe,ni)2~3n相和ξ-(fe,ni)2n相。
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