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OALib Journal期刊
ISSN: 2333-9721
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模拟空间原子氧对teflonfep/al薄膜性能的影响
Keywords: 高分子材料,原子氧,质量损失,表面粗糙度
Abstract:
？在模拟空间环境原子氧辐照的条件下,采用固定的原子氧束流密度进行不同时间的辐照试验,研究了温控材料teflonfep/al薄膜的质量损失、光学性能、表面形貌和表面粗糙度的演化规律.结果表明,材料的质量损失与原子氧的作用时间成正比.辐照前后材料的表面形貌和表面粗糙度发生明显变化,致使太阳吸收率发生明显变化,从而导致材料的光学性能发生变化.
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