全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...

高功率脉冲磁控溅射zrn纳米薄膜制备及性能研究

Keywords: 材料表面与界面,高功率脉冲磁控溅射,?氮化镐,?微观结构,?表面性能

Full-Text   Cite this paper   Add to My Lib

Abstract:

?采用高功率复合脉冲磁控溅射的方法(hppms)在不锈钢基体上制备zrn纳米薄膜,并研究了不同的工作气压对薄膜形貌、相结构及各种性能的影响。采用sem、xrd对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,无大颗粒,主要以zrn(111)和zrn(220)晶面择优生长,并呈现出多晶面竞相生长的现象。对薄膜硬度、弹性模量、耐磨性和耐腐蚀性的测试发现薄膜具有很高的硬度,最高可达33.1gpa,同时摩擦系数均小于0.2,耐腐蚀性也都有很大提高,腐蚀电位比基体提高了0.28v,腐蚀电流下降到未处理工件的1/5。工作气压较低时,薄膜耐磨耐蚀性能都较好,但在较高气压时,耐磨耐蚀性能出现一定的下降。

References

[1]  (吴大维,张志宏,罗海林,郭怀喜,范湘军,直流反应磁控溅射法淀积zrn薄膜,材料研究学报,11,207-208(1997))
[2]  4k.sarakinos,j.alami,s.konstantinidis,highpowerpulsedmagnetronsputtering:areviewonscientificandengineeringstateoftheart,surface&coatingstechnology,204,1661-1684(2010)
[3]  5j.-h.in,s.-h.seo,h.-y.chang,anovelpulsingmethodfortheenhancementofthedepositionrateinhighpowerpulsedmagnetronsputtering,surface&coatingstechnology,202,5298-5301(2008)
[4]  6p.va?ina,m.me?ko,m.ganciu,reductionoftransientregimeinfastpreionizedhigh-powerpulsed-magnetrondischarge,europhysicsletters,72,390-396(2005)
[5]  7tianxiubo,wuzhongzhen,shijingwei,gongchunzhi,yangshiqin,developmentanddischargebehaviorofhighpowerdensitypulsemagnetronsputteringsystem,vacuum,47,44-47(2010)
[6]  (田修波,吴忠振,石经纬,巩春志,杨士勤,高脉冲功率密度复合磁控溅射电源研制及放电特性研究,真空,47,44-47(2010))
[7]  12n.vershinin,k.filonov,b.straumal,w.gust,i.wiener,e.rabkin,a.kazakevich,corrosionbehaviouroftheprotectiveanddecorativecoatingsonlargeareasteelstrips,surfaceandcoatingstechnology,125,229-232(2000)
[8]  13caomeng,liqiang,dengxiangyun,lidejun,effectofionbombardingenergyonthepropertiesofzrn/tiainnanometermultilayeredcoatings,chinesejournalofmaterialsresearch,21,627-631(2007)
[9]  (曹猛,李强,邓湘云,李德军,离子轰击能量对zrn/tialn纳米多层膜性能的影响,材料研究学报,21,627-631(2007))
[10]  14e.budke,j.krempel-hesse,h.maidhof.decorativehardcoatingswithimprovedcorrosionresistance.surfaceandcoatingstechnology.112,108-113(1999)
[11]  15g.greczynski,j.jensen,j.bolmark,l.hultman,microstructurecontrolofcrnxfilmsduringhighpowerimpulsemagnetronsputtering,surface&coatingstechnology,205,118-130(2010)
[12]  16c.-p.liu,h.-g.yang,depositiontemperatureandthicknesseffectsonthecharacteristicsofdc-sputteredzrnxfilms,materialschemistryandphysics,86,370-374(2004)
[13]  1s.konstantinidis,j.p.dauchot,m.ganciu,a.ricard,m.hecq,influenceofpulsedurationontheplasmacharacteristicsinhigh-powerpulsedmagnetrondischarges,journalofappliedphysics,99,013307(2006)
[14]  2wudawei,zhangzhihong,luohailin,guohuaixi,fanxiangjun,propertiesofthezrnfilmspreparedbyreactivemagnetronsputtering,chinesejournalofmaterialsresearch,11,207-208(1997)
[15]  3v.kouznetsov,k.maca′k,j.m.schneider,anovelpulsedmagnetronsputtertechniqueutilizingveryhightargetpowerdensities,surfaceandcoatingstechnology,122:290-293(1999)
[16]  8a.p.ehiasariana,w.-d.mu¨nz,l.hultman,highpowerpulsedmagnetronsputteredcrnxfilms,surfaceandcoatingstechnology,163-164,267-272(2003)
[17]  9k.bobzin,n.bagcivan,p.immich,advantagesofnanocompositecoatingsdepositedbyhighpowerpulsemagnetronsputteringtechnology,j.mater.process.tech.,209,165-170(2009)
[18]  10j.alami,p.eklund,j.emmerlich,high-powerimpulsemagnetronsputteringofti–si–cthinfilmsfromati3sic2compoundtarget,thinsolidfilms,515,1731-1736(2006)
[19]  11w.d.sproul,high-ratereactivedcmagnetronsputteringofoxideandnitridesuperlatticecoatings,pergamon,51,641-646(1998)
[20]  17j.v.ramanaa,s.kumara,c.david,a.k.ray,v.s.raju,characterisationofzirconiumnitridecoatingspreparedbydcmagnetronsputtering,materialsletters,43,73-76(2000)
[21]  18d.r.mckenzie,y.yin,w.d.mcfall,n.h.hoang,theorientationdependenceofelasticstrainenergyincubiccrystalsanditsapplicationtothepreferredorientationintitaniumnitridethinfilms,j.phys.:condens.matter.,8,5883-5890(1996)
[22]  19zhangyujuan,wuzhiguo,zhangweiwei,lixin,yanpengxun,liuweimin,xuequnji,effectofdepositionparametersontextureoftinfilmsdepositedbyfilteredcathodcarcplasma,thechinesejournalofnonferrousmetal,14,1264-1268(2004)
[23]  (张玉娟,吴志国,张伟伟,李鑫,阎鹏勋,刘维民,薛群基,磁过滤等离子体制备tin薄膜中沉积条件对薄膜织构的影响,中国有色金属学报,14,1264-1268(2004))
[24]  20w.–j.chou,g.–p.yu,j.–h.huang,biaseffectofion-platedzirconiumnitridefilmonsi(100),thinsolidfilms,405,162-169(2002)
[25]  21z.wokulski,mechanicalpropertiesoftitaniumnitridewhiskers,physicastatussolidi(a),120,175-184(1990)
[26]  22j.schi?tz,k.w.jacobsen,amaximuminthestrengthofnanocrystallinecopper,science,301,1357-1359(2003)
[27]  23xuchengjun,studyonpropertiesoftinandzrnfilmsdepositedbymagnetronsputtering,masterdegreedissertationofchongqinguniversity,04(2005)
[28]  (徐成俊,磁控溅射tin及zrn薄膜的特性研究,重庆大学硕士论文,04(2005))
[29]  24j.alami,k.sarakinos,f.uslu,m.wuttig,ontherelationshipbetweenthepeaktargetcurrentandthemorphologyofchromiumnitridethinfilmsdepositedbyreactivehighpowerpulsedmagnetronsputtering,j.phys.d:appl.phys.,42,015304(2009)
[30]  25a.hecimovic,k.burcalova,a.p.ehiasarian,originsofionenergydistributionfunction(iedf)inhighpowerimpulsemagnetronsputtering(hipims)plasmadischarge,j.phys.d:appl.phys.,41,095203(2008)
[31]  26zhanghongtao,wangtianming,wangcong,progressinresearchoncorrosionresistanceofpvdhardcoating,materialsreview,16,15-16(2002)
[32]  (张洪涛,王天明,王聪,物理气相沉积技术制备的硬质涂层耐腐蚀的研究进展,材料导报,16,15-16(2002))
[33]  27r.constantin,b.miremad,performanceofhardcoatingsmadebybalancedandunbalancedmagnetronsputteringfordecorativeapplications,surfaceandcoatingstechnology,120-121,728-733(1999)

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133