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OALib Journal期刊
ISSN: 2333-9721
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mfi型分子筛膜晶内孔道的在线cvd调变
DOI: 10.3969/j.issn.1671-7627.2013.04.009, PP. 43-47
Keywords: 分子筛膜,修饰,h2/co2分离
Abstract:
采用在线化学气相沉积(cvd)法对全硅mfi型分子筛膜进行晶内孔道修饰,考察晶间缺陷对膜晶内孔道修饰效果的影响。采用硅烷水解法对缺陷较多的膜进行缺陷孔的修补,结合扫描电子显微(sem),观察膜微结构的变化。结果表明:分子筛膜表面缺陷显著影响晶内孔道调变效果。500℃时,缺陷较少的膜经晶内修饰后h2/co2分离因子由修饰前的2.7提高到42.3,h2渗透性由2.25×10-7mol/(m2·s·pa)降至1.52×10-7mol/(m2·s·pa)。经缺陷修补后的分子筛膜,其晶内修饰后的h2/co2分离因子比未修补的膜有一定幅度的提高。
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