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Si基CdTe/HgCdTe分子束外延材料的位错抑制

Keywords: 碲镉汞,热退火,位错,分子束外延

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Abstract:

基于GaAs/Si材料中位错的运动反应理论,修正获得CdTe/Si和HgCdTe/Si外延材料中的位错运动反应模型.采用快速退火方法对Si基HgCdTe外延材料进行位错抑制实验研究,实验结果与理论曲线基本吻合,从理论角度解释了不同高温热处理条件对材料体内位错的抑制作用.对于厚度为4~10μm的CdTe/Si进行500℃快速退火1min,可使位错密度降低0.5~1个数量级,最好结果为2.5?105cm-2.

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