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采用ZnCdTe衬底的MBEHg1—xCdxTe位错密度研究

Keywords: 分子束外延,Hg1-xCdxTe薄膜,位错密度,MBE,汞镉碲薄膜,ZnCdTe,锌镉碲化合物,红外焦平面探测器,生长条件

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Abstract:

报道了用MBE的方法,在ZnCdTe衬底上制备Hg1-xCdxTe薄膜的位错密度的研究结果.研究发现Hg1-xCdxTe材料的位错密度与ZnCdTe衬底的表面晶体损伤、Hg1-xCdxTe生长条件以及材料组分密切相关.通过衬底制备以及生长条件的优化,在ZnCdTe衬底上生长的长波Hg1-xCdxTe材料EPD平均值达到4.2×105cm-2,标准差为3.5×105cm-2,接近ZnCdTe衬底的位错极限.可重复性良好,材料位错合格率为73.7%,可满足高性能Hg1-xCdxTe焦平面探测器对材料位错密度的要求.

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