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全息光刻和二次显影法制备柱形二维光子晶体

Keywords: 全息光刻,二维光子晶体,柱形,二次显影

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Abstract:

采用全息光刻和二次显影的方法制备了柱形二维光子晶体.在此过程中,二维点状的周期结构首先在正性光刻胶上直接形成,然后经由Si3N4硬掩模转移到衬底材料上.利用二次显影的方法,曝光强度最强和曝光强度中等区域的光刻胶能够被同时充分显影,而曝光强度最弱区域的光刻胶则可以完全被保留下来.通过调节入射角,可以方便地调节二维结构的周期.利用此方法,在相对较大的面积上制备了不同周期的二维结构,二维结构具有很好的均匀性和重复性.文章对有关的工艺参数进行了详细讨论.

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