Toshihiro Shintaku, Takehiko Uno. Preparation of Ce-substituted yttrium iron garnet films for magneto-optic waveguide devices[J]. Jpn J Appl Phys; 1996, 35(9A): 1689-4691.
[2]
WANG Yang-Yuan, GUAN Xu-Dong, MA Qun-Ru. The Basic Process of Integrated Circuits[M]. Beijing:Press of Advanced education (王阳元,关旭东,马俊如.集成电路工艺基础.北京:高等教育出版社), 1991, 185-197.
[3]
Yamada H, Yamada M, Terui H, et al. Optical interconnections using a silica-based optical waveguide on a silicon substrate[J]. Opt. Eng., 1989, 28(12): 128-1289.
[4]
Sugimoto N, Terui H, Tate A, et al. A hybridintegrated waveguide isolator on a silica-based plannar lightwave circuit[J]. Lightwave Technol., 1996, 14(11): 2537-2546.
[5]
Toshihiro Shintaku, Akiyuki Tate, Shinji Mino. Ce-substituted yttrium iron garnet films prepared on Gd3Sc2Ga3O12 garnet substrates by sputter epitaxy[J]. Appl Phys Lett., 1997, 71(12): 1640-1642.
[6]
Uno T, Noge S. Growth of magneto-optic Ce∶YIG thin films on amorphous silica substrates[J].Euro. Ceramic Soc., 2001, 21: 1957-1960.
[7]
Gomi M, Furuyama, Abe M, Strong maneto-optical enhancement in highly Ce-substituted iron garnet films prepared by sputtering[J]. Appl Phys., 1991, 70(11): 7065-7067.
[8]
Kawachi M. Silica waveguides on silicon and their application to integrated-optic components[J]. Opt. Quantum Electron, 1990, 22(5): 391-416.
[9]
Akiyuki tate, Uno T, Mino S, et al. Crystallinity of Ce substituted YIG films prepared by RF sputtering[J]. Appl. Phys., 1996, 35(6A): 3419-3425.
[10]
Shinji Mino, Tate A, Uno T, et al. Structure and lattice deformation of Ce substituted yttrium iron garnet film prepared by RF sputtering[J]. Appl. Phys., 1993, 32(7): 3154-3159.
