全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...

双等离子体离子源的工作特性

, PP. 161-166

Keywords: 仪器仪表技术,二次离子质谱,双等离子体离子源,离子光学系统,离子束亮度

Full-Text   Cite this paper   Add to My Lib

Abstract:

针对双等离子体离子源受气压、磁场强度和放电电流影响,产生的O-离子束亮度不稳定的问题,设计并搭建了一套用于测试离子束亮度的离子光学系统,以SHRIMPII上的双等离子体离子源为对象,通过实验和仿真模拟分别研究了气压、磁场强度和放电电流对O-离子束亮度的影响规律。结果表明:该离子源能够稳定地工作在放电电流大于50mA,气压为110~170mTorr(1Torr=133.322Pa)的条件下;当气压为140mTorr、放电电流为200mA、磁场强度为0.25T时,获得的O-离子束亮度能够达到52.4A/(cm2·sr)。合理控制离子源工作参数,可以增大O-离子束亮度,提高二次离子质谱的横向分辨率和灵敏度。

References

[1]  徐福兴,王亮,罗娟,等. 一种新型二次离子质谱的一次离子源及其离子光学系统[J]. 分析化学,2011,39(10):1501-1505.Xu Fu-xing, Wang Liang, Luo Chan, et al. A novel primary ion source and ion optics of secondary ion mass spectrometry[J]. Chinese J Anal Chem, 2011, 39(10): 1501-1505.
[2]  周强,李金英,梁汉东,等. 二次离子质谱(SIMS)分析技术及应用进展[J]. 质谱学报,2004,25(2):113-120.Zhou Qiang, Li Jin-ying, Liang Han-dong, et al. Recent developments on secondary ion mass spectrometry[J]. Chinese Journal of Chinese Mass Spectrometry Society, 2004, 25(2): 113-120.
[3]  Alfred Benninghoven. Chemical analysis of inorganic and organic surfaces and thin films by static time-of-flight secondary ion mass spectrometry (TOF-SIMS)[J]. Angewandte Chemie International Edition in English,1994, 33(10): 1023-1043.
[4]  査良镇,桂东,朱怡峥. 二次离子质谱学的新进展[J].真空科学与技术学报,2001,21(2):129-136.Cha Liang-zhen,Gui Dong,Zhu Yi-zheng.Latest progress in secondary ion mass spectroscopy[J].Vaccum Science and Technology,2001,21(2):129-136.
[5]  Pillatsch L, Wirtz T, Migeon H N, et al. Use of a duoplasmatron ion source for negative ion generation[J]. Nuclear Instruments and Methods in Physics Research, 2011, 269(9): 1606-1609.
[6]  赵墨田,曹永明,陈刚,等. 无机质谱概论[M].北京:化学工业出版社,2006:64-65.
[7]  Lejeune C. Theoretical and experimental study of the duoplasmatron ion source[J]. Nucl Instrum Methods, 1974, 116(3):417-428.
[8]  Smith N S, Tesch P P, Martin N P, et al. A high brightness source for nano-probe secondary ion mass spectrometry[J]. Applied Surface Science, 2008, 255(4): 1606-1609.
[9]  Coathe C D, Long J V P. A high-brightness duoplasmatron ion source for microprobe secondary-ion mass spectrometry[J]. Rev Sci Instrum, 1995, 66(2): 1018-1023.
[10]  Yasuyuki Ishii, Akira Isoya, Takuji Kojima, et al. Estimation of keV submicro ion beam width using a knife-edge method[J]. Nuclear Instruments and Methods in Physics Rearch, 2003, 211(3):415-424.
[11]  徐均琪,杭凌侠,弥谦,等. 宽束冷阴极离子源的工作特性研究[J]. 真空科学与技术学报, 2008, 28(3): 266-270.Xu Jun-qi, Hang Ling-xia, Mi Qian, et al. Operating characteristics of newly modified broad beam ion source[J]. Vaccum Science and Technology, 2008, 28(3): 266-270.

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133