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材料工程  2007 

PECVD法制备硅基ZnO薄膜光学性能的研究

, PP. 71-75

Keywords: Si(111),ZnO薄膜,等离子增强化学气相沉积,反射光谱

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Abstract:

使用薄膜分析系统研究在不同衬底温度下生长的硅基ZnO薄膜反射谱,了解衬底温度对薄膜的结晶状况影响。研究结果表明,随衬底温度的升高,晶粒之间融合长大,薄膜的折射率增大;在衬底温度450℃时生长的ZnO薄膜,薄膜的折射率最大为4.2,反射谱的吸收边更接近380nm,在520nm处有一个弱的吸收峰,与ZnO薄膜的PL谱测试结果一致。再升高衬底温度,晶粒会出现异常长大,晶粒排布将受到影响,导致薄膜折射率下降。

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