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材料工程  2013 

Ti6Al4V表面磁控溅射高硬SiC薄膜的摩擦磨损性能

DOI: 10.3969/j.issn.1001-4381.2013.06.013, PP. 63-66

Keywords: 钛基材,薄膜,纳米压痕,摩擦磨损,磁控溅射

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Abstract:

采用室温磁控溅射技术在Ti6Al4V表面制备出高硬SiC薄膜,对其组织结构、纳米压痕行为和摩擦磨损性能进行了研究。结果表明实验制备的SiC薄膜呈非晶态,其纳米硬度、弹性模量分别为26.8GPa和229.4GPa;在以氮化硅球(半径为2mm)为对摩件的室温Kokubo人体模拟体液下,其磨损速率在10-5mm3m-1N-1级,载荷低(50g)时摩擦因数约为0.173,载荷高(200g)时摩擦因数约为0.280,此时薄膜自身发生局部破裂。

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