GREGORY T A KOVACS. M icromach ined Transducers Sourcebook[M ]. Trans labe by ZHANG Wendong. Be ijing: Science Pub lish ing Company, 2000: 18-19. ( in Ch inese)
SU Y,i TAN Songsheng, SUN Chenglong, et a .l Research on anisotropy and un iform ity in etch ing Si by using reactive ion etch2 ing and plasma etch ing systems[ J]. Journal ofT ransc luction Technology, 1994( 2): 36-40. ( in Chinese)
LU Jianzu, WE IH ongzhen, LIYu jian, e t a .l Mode ling and s imu la tion of reactive ion etch ing technology[ J]. Journa l ofFunc2 tionalMater ials and Devices, 2000, 6( 4): 420-424. ( in Chinese)
[6]
[ LEGTENBERG R, JANSEN H, DE BOER M. Anisotrop ic reactive e tch ing of silicon using SF6 /O2 /CH F3 gasmixtures[ J]. J E lectrochem Soc, 1995, 142( 6) : 2020-2028.
ZHANG Jin, FENG Boru, DU Chun le,i et a.l Resea rch on the technolog ica l factors for the reactive ion e tch ing[ J]. Opto2E lec2 tron ic Engineer ing, 1997( 24) : 46-51. ( in Ch inese)
HAO H uijuan, ZHANG Yulin, LUWenjuan. Reactive ion etch ing of SiO2 [ J] . Equipment for E lec tron ic ProductsManufactur2 ing, 2005( 126): 48-51. ( in Chinese)
[13]
[ CH INOY, PERCY B. Reactive ion etching of benzocyc lobutene p loymer films[ J]. IEEE T rans Comp PackagManufact: Tech2 nol Part C, 1997, 20( 3): 199-206.