LUQUE A. Handbook of Photovohaic Science and Engineering [M]. New York: John Wiley 8L Sons Inc., 2010: 167－172.
[2]
CANIZO C DEL, COSO G DEL, LUQUE A. Disclosing the polysilicon deposition process [C]//The 25th European Photovoltaic Solar Energy Conference and Exhibition, Valencia, 2010: 1216－1219.
SUN Peng. Study on polysilicon reduction furnace’s flow field and temperature field through numerical simulation and energy analysis (in Chinese, dissertation). Wuhan: Huazhong University of Science & Technology, 2012.
HUANG Guoqiang, MAO Junnan, WANG Hongxing, et al. J Synth Cryst, 2012, 41(3): 680－686.
[26]
毛俊楠.多晶硅还原工艺的流程模拟与优化[D].天津：天津大学，2012.
[27]
MAO Junnan. Simulation and optimization of polysilicon reduction process (in Chinese, dissertation). Tianjin: Tianjin University, 2012.
[28]
COSO G DEL, CANIZO C DEL, LUQUE A. Chemical vapor deposition model of polysilicon in a trichlorosilane and hydrogen system[J]. Electrochem Soc, 2008, 155(6): 485－491.
[29]
HABUKA H, NAGOYA T, MAYUSUMI M, et al. Model on transport phenomena and epitaxial growth of silicon thin film in SiHC13－H2 system under atmospheric pressure[J]. Cryst Growth, 1996, 169(1): 61－72.
[30]
HABUKA H, AOYAMA Y, AKIYAMA S, et al. Chemical process of silicon epitaxial growth in a SiHC13－H2 system[J]. Cryst Growth, 1999, 207(1－2): 77－86.
[31]
KE Zengpeng, YANG Zhiguo, LIU Xin, et al. Semic Technol, 2010, 35(10): 994－998.
