OALib Journal期刊
ISSN: 2333-9721
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炭黑的“impurity-free”改性及其在聚酰亚胺薄膜中的分散特性研究
DOI: 10.3724/SP.J.1105.2012.11381, PP. 876-882
Keywords: 聚酰胺酸,炭黑,纳米分散
Abstract:
利用聚酰胺酸(PAA)在研磨过程形成炭黑(CB)的"impurity-free"分散剂制备纳米CB填充聚酰亚胺(PI)高性能复合薄膜.球磨CB和PAA/N-甲基-2-吡咯烷酮(NMP)溶液的混合液,PAA在研磨过程中降解形成活性分子,原位生成与CB表面具有反应活性和强烈物理吸附能力的"impurity-free"分散剂.拉曼、红外以及紫外-可见光吸收光谱证实了降解PAA分子对CB的改性作用.经改性的CB与PAA溶液共混,涂覆固化制备PI/CB复合薄膜.TEM照片表明该分散剂可以显著促进CB粒子在PI基体中的均匀分散,分散粒径约为200nm.力学性能测试和导电性能测试表明PI/CB复合薄膜的断裂伸长率大幅提高,电阻率(ρ)重复性浮动范围从2个数量级降到1个数量级.进一步研究发现,研磨过程中添加高分子量PAA更有利于CB在PI基体中的均匀分散.
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