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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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等离子体化学气相沉积Ti-N-C膜的研究
, PP. 87-92
Keywords: 等离子体化学气相沉积(PCVD),Ti-N-C膜,TiN膜
Abstract:
用XPS,AES,XRD,SEM及显微硬度计分析和测试了不同成分的等离子体化学气相沉积(PCVD)Ti—N—C膜,并与PCVD一TiN膜比较。认为Ti—N—C膜优异的耐磨性可归因于高显微硬度及致密的结构。AES及XPS分析结果表明,Ti—N—C与TiN膜表面吸附的氧原子价态不同,其决定因素是膜晶格中是否有足够的碳原子存在。氧吸附态的不同可能导致不同的磨损失效方式。
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