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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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离子注入Cu薄膜的氧化行为研究
, PP. 1187-1191
Keywords: Cu薄膜,离子注入,Cr,氧化
Abstract:
研究了用强流金属蒸汽弧离子源（ＭＥＶＶＡ源）注入Ｃｒ对Ｃｕ薄膜的抗氧化性能、导电性能和氧化特征的影响.利用Ｘ射线衍射、Ｒｕｔｈｅｒｆｏｒｄ背散射和扫描电镜离子注入前后氧化物结构和氧化物形态演变.结果表明,在薄膜的表面层注入一定剂量的Ｃｒ能有效地改善Ｃｕ薄膜的抗氧化性能,而对薄膜的电导性能无显著影响；离子注入显著影响薄膜表面氧化铜的结构和形态.探讨了离子注入对氧化铜结构和形态的影响机理.
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