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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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(Ti,Al)N涂层应力沿层深分布的调整及大厚度涂层的制备
DOI: 10.3724/SP.J.1037.2011.00504, PP. 277-282
Keywords: (Ti,Al)N,硬质涂层,应力分布,调整应力,N2分压
Abstract:
利用电弧离子镀技术在不锈钢基体上制备了(Ti,Al)N涂层,研究了N2分压改变对涂层残余应力沿层深分布及相关力学性能的影响.结果表明,低N2分压下,(Ti,Al)N涂层残余应力沿层深分布较均匀,随N2分压的增加,涂层应力沿层深呈“钟罩型”分布,且全膜厚的应力值也明显增大;通过对涂层生长结构及微观成分分析,初步探讨了应力分布机理.随N2分压的增加,涂层硬度会显著增加,而膜/基结合力则大幅下降;采用改变N2分压工艺制备(Ti,Al)N涂层,可有效调整涂层残余应力沿层深分布趋势,改善其力学性能,并可成功制备厚度在130μm以上的硬质涂层.
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