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金属学报  2012 

Si含量对电弧离子镀Ti-Al-Si-N薄膜组织结构和力学性能的影响

DOI: 10.3724/SP.J.1037.2012.00328, PP. 1349-1356

Keywords: 磁过滤电弧离子镀,Ti-Al-Si-N薄膜,纳米硬度,结合强度

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Abstract:

利用磁过滤电弧离子镀技术在高速钢基体上制备了不同Si含量的Ti-Al-Si-N薄膜,研究了Si含量对薄膜组织结构以及力学性能的影响.结果表明,Ti-Al-Si-N薄膜主要由晶态TiAlN和非晶态的Si3N4组成,随着Si含量的增加,XRD衍射峰强度减弱,晶粒尺寸减小;薄膜的显微组织也由明显的柱状晶转变为致密的纳米晶结构.利用纳米硬度仪对薄膜的硬度和弹性模量进行了分析,结果表明,薄膜的硬度和弹性模量有着相似的变化趋势,随着Si含量的增加,两者都先增加,当Si含量达到一定程度时,它们会逐渐稳定在一定范围内,而后又随Si含量的继续增加呈下降趋势.通过划痕测试对薄膜结合强度进行了分析,结果表明,薄膜与基体的结合强度随Si含量的增加先减小而后增加.

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