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OALib Journal期刊
ISSN: 2333-9721
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用扫描电镜直接观察变形材料中的位错结构──[001]取向铜单晶疲劳位错结构的研究
, PP. 561-565
Keywords: 扫描电镜,电子通道衬度技术,铜单晶体,位错结构
Abstract:
用扫描电镜（SEM）的电了通道讨度（ECC）技术研究了[001]取向铜单晶中的疲劳位错结构结果表明，SEMECC技术不仅可以真实地、全面地显示疲劳位错组态，而且还揭示了表面出现的宏观形变带与位错结构的对应关系.
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