OALib Journal期刊
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金属β-二酮化合物用于MOCVD法生长铁电氧化物薄膜*
Keywords: 金属β-二酮化合物,金属有机化学气相沉积,铁电薄膜
Abstract:
对用于MOCVD法生长铁电氧化物薄膜的金属β-二酮化合物的制备、结构及性质进行了评述,对它们在生长铁电薄膜中的应用现状进行了介绍,并对它们的应用前景作了展望。
References
[1] | [ 1 ] Utsunomiya K. Anal. Chim. Acta, 1972, 59 (1) : 147—151
|
[2] | [ 4 ] Van Hemert R L , Spendlove L B, Sievers R E. J. Electrochem. Soc. , 1965, 112 (11) : 1123—1126
|
[3] | [ 5 ] Chattoraj S C, Cupka A G, Sievers R E. J. Inorg. Nucl.Chem. , 1966, 28: 1937—1943
|
[4] | [ 7 ] Watson I M. Chem. Vap. Deposition, 1997, 3 (1) : 9—26
|
[5] | [ 8 ] Tiitta M , Niinisto L. Chem. Vap. Deposition, 1997, 3 (4) :167—182
|
[6] | [ 9 ] Jones A C, Leedham T J , Davies H O , et al. Polyhedron,2000, 19: 351—355
|
[7] | [ 10 ] Jones A C. Chem. Vap. Deposition, 1998, 4 (5) : 169—179
|
[8] | [ 12 ] Peng C H, Desu S B. J. Am. Ceram. Soc. , 1994, 77 (7) :1799—1812
|
[9] | [ 14 ] Kawahara T, Yamamuka M , Makita T, et al. Jpn. J. Appl.Phys. , 1994, 33: 5897—5902
|
[10] | [ 15 ] Halasyamani P S, Poeppelmeir K R. Mater. Chem. , 1998, 10(10) : 2753—2769
|
[11] | [ 19 ] Drozdov A A , Trojanov S I. Polyhedron, 1992, 11: 2877—2882
|
[12] | [ 21 ] Brooks J , Davies H J , Leedham A C, et al. Chem. Vap. Deposition, 2000, 6 (2) : 66—69
|
[13] | [ 23 ] Sicre J E, Dubois J T, Eisentraut K J , et al. J. Am. Chem.Soc. , 1969, 91: 3476—3481
|
[14] | [ 24 ] Malik M A , O’Brien P, Motevalli M , et al. Polyhedron,1999, 18: 1641—1646
|
[15] | [ 25 ] Desu S B, Nyman M , Agaskar P A. US 5 348 631, 1994(Chem. Abstr. , 1994, 121: 268488)
|
[16] | [ 26 ] Massiani M C, Papiernik R, Hubert-Pfalzgraf L G, et al.Polyhedron, 1991, 10 (4) : 437—445
|
[17] | [ 28 ] Rubtsov E M , Mishin V Y, Kood. Khim, 1982, 8 (5) : 651—652
|
[18] | [ 29 ] 曹传宝(Cao C B) , 彭定坤(Peng D K) , 杨萍华(Yang P H) 等.中国科学技术大学学报(J. Chinese Univ. Sci. & Tech. ) ,1992, 22 (3) : 336—341
|
[19] | [ 31 ] Kobayashi I. Nippon Kagaku Kaishi, 1992, 12: 1515—1517
|
[20] | [ 32 ] Davies H O , Leedham T J , Jones A C, et al. Polyhedron,1999, 18: 3165—3172
|
[21] | [ 34 ] Troyanov S I, Gorbenko O Y. Polyhedron, 1997, 16 ( 5) :777—780
|
[22] | [ 37 ] Chou K S, Hwang M J , Shu M Y. Thermochim. Acta, 1994,233 (1) : 114—152
|
[23] | [ 39 ] Fleeting K A , O’Brien P, Davies H O , et al. Chem. Vap. Deposition, 1999, 5 (6) : 261—264
|
[24] | [ 40 ] Ryu H K, Heo J S, Cho Sê , et al. J. Electrochem. Soc. ,1999, 146 (3) : 1117—1121
|
[25] | [ 41 ] Jones A C, Leedham T J , Wright P J , et al. Chem. Vap. Deposition, 1998, 4 (5) : 197—201
|
[26] | [ 44 ] Jo W , Kim D C, Lee H M , et al. J. Korean Phys. Soc. ,1998, 32: S1442—S1444
|
[27] | [ 2 ] Berg E W , Shendrikar A D. Anal. Chim. Acta, 1969, 44 (1) :159—164
|
[28] | [ 3 ] Berg E W , Herrera N M. Anal. Chim. Acta, 1972, 60 (1) :117—125
|
[29] | [ 6 ] Dahmen K H, Gerfin T. Prog. Cryst. Grow th Charact. ,1993, 27: 117—125
|
[30] | [ 11 ] Kawahara T, Matsuno S, Yamamuka M. Jpn. J. Appl.Phys. , 1999, 38: 2205—2209
|
[31] | [ 13 ] Hendrix B C, Glassman T E, Roeder J F. Mater. Res. Soc.Symp. Proc. , 2000, 596 (Ferroelectric Thin Films D ) : 143—148
|
[32] | [ 16 ] Van Buskirk P C, Bilodeau S M , Roeder J F, et al. Jpn. J.Appl. Phys. , 1996, 35: 2520—2525
|
[33] | [ 17 ] Turnipseed S B, Barkley R M , Sievers R E. Inorg. Chem. ,1991, 30: 1164—1170
|
[34] | [ 18 ] Drozdov A A , Trojanov S I, Pisarevsky A P, et al. Polyhedron, 1994, 13: 2459—2461
|
[35] | [ 20 ] Drake S R, Hursthouse M B, Abdul Malik K M , et al. J.Chem. Soc. Dalton. Trans. , 1993: 2883—2890
|
[36] | [ 22 ] Amano R, Sato A , Suzuki S. Bull. Chem. Soc. Jpn. , 1981,54 (5) : 1368—1374
|
[37] | [ 27 ] Masaru D, Kentaro H, Fusao N , et al. Nippon Kagaku Kaishi, 1995, 10: 802—808
|
[38] | [ 30 ] Jones A C, Leedham T J , Wrigh t P J , et al. Chem. Vap. Deposition, 1998, 4 (2) : 46—49
|
[39] | [ 33 ] Errington R J , Ridland J , Clegg W , et al. Polyhedron, 1998,17 (5) : 659—674
|
[40] | [ 35 ] Bradley D C. Chem. Rev. , 1989, 89: 1317—1322
|
[41] | [ 36 ] Sato H, Sugawara S. Inorg. Chem. , 1993, 32 (10) : 1941—1945
|
[42] | [ 38 ] Drozdov A , Kuz’m ina N , Troyanov S, et al. Mater. Sci.Eng. , 1993, B18 (2) : 139—140
|
[43] | [ 42 ] Lee J H, Rhee S W. J. Electrochem. Soc. , 1999, 146 (10) :3783—3787
|
[44] | [ 43 ] Kawahara T, Yamamuka M , Makita T, et al. Jpn. J. Appl.Phys. , 1994, 33: 5129—5134
|
[45] | [ 45 ] Strem Catalog NO. 18 , 1999—2000
|
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