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恒定磁场阻垢除垢的分子动力学模拟

DOI: 10.13336/j.1003-6520.hve.2015.05.025, PP. 1603-1609

Keywords: 磁场阻垢,磁场除垢,分子动力学,径向分布函数,峰值坐标,峰值强度,Material,Explorer

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Abstract:

磁场的阻垢除垢机理研究不足阻碍了该法的实际应用。为了进一步认识恒定磁场的阻垢除垢机理,研究了不同磁感应强度、不同温度下的阻垢除垢效果。建立模型A和模型B,其中模型A是含少量钙离子和碳酸根离子的水溶液,模型B是包含方解石(10)晶面与水接触的混合体系。用分子动力学软件MaterialExplorer5.0研究在改变磁感应强度和体系温度下,模型A、B分别表现出的阻垢除垢效果。结果表明对于模型A,只有温度<323K时,磁场的作用下才能表现出阻垢效果,而且磁感应强度与模型温度的不同组合会导致3种趋势阻垢、促垢、无变化。对于模型B,在磁感应强度与温度改变多次组合后,并未发现有导致水垢被溶解的情形。由此可得恒定磁场的除垢效果缺乏机理的支撑。

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