HHY Lou,F HWang,B J Xia,et al.High-temperature oxidationresistance of sputtered micro-grain superalloy K38G[J].Oxi-dation of Metals,1992,38(3-4):299.
[2]
HHY Lou,F HWang,S L Zhu,et al.Oxide formation of K38Gsuperalloy and its sputtered micrograined coating[J].Surface&Coatings Technology,1994,63(2):105.
[3]
HHY Lou,S LZhu,F HWang.Rehealing ability of oxide scalesformed on microcrystalline K38G coatings[J].Oxidation ofMetals,1995,43(3-4):317.
[4]
FF HWang,H Y Lou,W T Wu.The oxidation resistance of asputtered,microcrystalline TiAl-intermetallic-compound film[J].Oxidation of Metals,1995,43(5-6):395.
[5]
FF HWang,H Y Lou,S L Zhu,et al.The mechanism of scaleadhesion on sputtered microcrystallized CoCrAl films[J].Oxi-dation of Metals,1996,45(1-2):39.
[6]
FF HWang.The effect of nanocrystallization on the selective ox-idation and adhesion of Al2O3scales[J].Oxidation of Metals,1997,48(3-4):215.
[7]
ZZ L Tang,F H Wang,W T Wu.Effect of a sputtered TiAlCrcoating on the oxidation resistance of TiAl intermetallic com-pound[J].Oxidation of Metals,1997,48(5-6):511.
[8]
FF HWang.Oxidation resistance of sputtered Ni3(AlCr)nano-crystalline coating[J].Oxidation of Metals,1997,47(3-4):247.
[9]
ZZ Y Liu,W Gao,H Gong.Anisothermal oxidation of micro-crystalline Ni-20Cr-5A1 alloy coating at 850-1280 degrees C[J].Scripta Materialia,1998,38(7):1057.
[10]
G F Chen,H Y Lou.Effect of nanocrystallization on the oxideformation of Ni-5Cr-5Al alloy[J].Journal of Materials ScienceLetters,1999,18(23):1957.
[11]
G F Chen,HY Lou.The effect nanocrystallization on the oxideformation on Ni-11Cr-8Al alloy[J].Scripta Materialia,2000,43(2):119.
J TGuo,C MXu.Effect of NiAl microcrystalline coating on thehigh-temperature oxidation behavior of NiAl-28Cr-5Mo-1Hf[J].Oxidation of Metals,2002,58(5-6):457.
[14]
MHLi,Z Y Zhang,X R Sun,et al.Oxidation behavior of sput-ter-deposited NiCrAlY coating[J].Surface&Coatings Tech-nology,2003,165(3):241.
[15]
B Wendler,L Kaczmarek,L Klimek,et al.Nanocrystalline gamma-TiAl based microalloyed coatings as gas corrosion barriers[J].Re-views on Advanced Materials Science,2004,8(2):116.
[16]
P Saltykov,O Fabrichnaya,J Golczewski,et al.Thermodynamicmodeling of oxidation of Al-Cr-Ni alloys[J].Journal of Alloysand Compounds,2004,381(1-2):99.
[17]
B Ning,MShamsuzzoha,ML Weaver.Microstructure and prop-erty analysis of DC magnetron sputtered NiAl-0.6Hf coatings[J].Surface&Coatings Technology,2005,200(5-6):1270.
[18]
X Peng,J Yan,Y Zou,et al.Effect of grain refinement on theresistance of 304 stainless steel to breakaway oxidation in wetair[J].Acta Materialia,2005,53(19):5079.
[19]
Mukherjee D,Khan AA,Kumar MR,et al.Metastable surfacemodification processes for corrosion and oxidation control[J].Surface Engineering,2006,22(5):411.
[20]
S LYang,F HWang.Effect of nanocrystallization on sulfur seg-regation in Fe-Cr-Al alloy during oxidation at 1000 degrees C[J].Oxidation of Metals,2006,65(3-4):195.
[21]
W Wen,Y Ping,F HWang,et al.The effect of yttrium additionon the isothermal oxidation behavior of sputtered K38 nanocrys-talline coating at 1273 K in air[J].Surface&Coatings Tech-nology,2007,201(16-17):7425.
[22]
O P Karpenko,J C Bilello,S MYalisove.Growth anisotropy andself-shadowing:A model for the development of in-plane tex-ture during polycrystalline thin-film growth[J].Journal ofApplied Physics,1997,82(3):1397.
[23]
S Zhu,Y Xiong,F Zhang,et al.Computer simulation of mor-phology evolution of oxide scales during oxidation[J].MaterialsScience Forum,2004,461-464:147.
[24]
J C Sit,D Vick,K Robbie,et al.Thin film microstructure con-trol using glancing angle deposition by sputtering[J].Journal ofMaterials Research,1999,14(4):1197.
[25]
R Messier,T Gehrke,C Frankel,et al.Engineered sculpturednematic thin films[J].Journal of Vacuum Science&Technolo-gy A,1997,15:2148.
[26]
K Robbie,J C Sit,MJ Brett.Advanced techniques for glancingangle deposition[J].Journal of Vacuum Science&TechnologyB,1998,16:1115.
[27]
I Hodgkinson,Q H Wu,A McPhun.Incremental-growth modelfor the deposition of spatially modulated thin film nanostruc-tures[J].Journal of Vacuum Science&Technology B,1998,16:2811.
[28]
J Lintymer,J Gavoille,N Martin,et al.Glancing angle deposi-tion to modify microstructure and properties of sputter depositedchromium thin films[J].Surface&Coatings Technology,2003,174:316.
P Morrow,F Tang,T Karabacak,et al.Texture of Ru columnsgrown by oblique angle sputter deposition[J].Journal of Vacu-um Science&Technology A,2006,24(2):235.
[31]
Kaufman DY,DeLuca PM,Tsai T,et al.High-rate deposition ofbiaxially textured yttria-stabilized zirconia by dual magnetronoblique sputtering[J].Journal of Vacuum Science&Technolo-gy A,1999,17(5):2826.
[32]
J R Frederick,J D'Arcy-Gall,D Gall.Growth of epitaxial CrNon MgO(001):Role of deposition angle on surface morphologi-cal evolution[J].Thin Solid Films,2006,494(1-2):330.
[33]
G F Chen,HY Lou.Effect of Nanocrystallization on the oxida-tion behavior of a Ni-8Cr-3.5Al Alloy[J].Oxidation of Metals,2000,54(1/2):155.
