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化工学报  2014 

三氯化铁除砷和镉的机理

DOI: 10.3969/j.issn.0438-1157.2014.10.048, PP. 4118-4122

Keywords: 三氯化铁,,镉去除机理,电荷分布多位络合模型

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Abstract:

采用电荷分布多位络合模型模拟(CD-MUSIC)、XPS、FTIR和Zeta电位分析的方法研究了三氯化铁去除As(Ⅴ)、Cd(Ⅱ)的机理。结果表明:在pH3~7范围内,砷、镉通过竞争铁氧化物表面的有效作用位点而相互抑制;而在pH7~10范围内,Cd(Ⅱ)主要以Cd(OH)2沉淀的方式得以去除,并通过共沉淀作用促进砷的去除。根据CD-MUSIC模拟结果,As(Ⅴ)主要形成单齿单核质子化(FeOAsO3H1.5-、FeOAsO(H2O)20.5-)的表面配合物,结合常数分别为63.04、66.50;而Cd(Ⅱ)则以FeOHCd1.5+形态结合在铁氧化物的表面,结合常数为31.05,其含量随着pH的升高逐渐减少。

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