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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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用气相沉积方法在低气压下制备BN的高压相：E-BN、c-BN、w-BN
DOI: 10.11858/gywlxb.2000.02.005, PP. 111-114
Keywords: E-BN,c-BN薄膜,相变,高压相材料
Abstract:
用射频磁控溅射方法得到了低应力立方氮化硼薄膜。红外光谱结果表明，薄膜具有很好的附着力，且含有少量的E-BN和w-BN。电子衍射谱表明薄膜表层是纯立方相。同时利用此方法得到了E-BN薄膜。认为在薄膜生长过程中可能经历了一个从E-BN到c-BN的相转变过程。
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