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超高速发射中缓冲层材料对钽飞片速度影响的数值分析

DOI: 10.11858/gywlxb.2008.01.005, PP. 19-24

Keywords: 超高速发射,数值计算,缓冲层

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Abstract:

在超高速发射技术研究中,缓冲层材料起着十分重要的作用。通过数值计算,分析了TPX缓冲层材料的厚度对高阻抗钽飞片超高速发射速度的影响,给出了最优的缓冲层材料厚度,对于0.3和0.5mm厚的钽飞片,选取不同厚度的TPX缓冲层材料,钽飞片中心速度的相对误差达到5%~6%;为了比较不同缓冲层材料对钽飞片速度的影响,还给出了相同厚度的TPX和Lexan材料作缓冲层时,钽飞片的中心速度和压力历史的二维计算结果。

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