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Solid-State Reaction and Vacancy-Type Defects in Bilayer Fe/Hf Studied by the Slow Positron Beam

DOI: 10.4236/jamp.2015.32034, PP. 233-239

Keywords: Metallic Films, Positron Annihilation Measurement, Solid-State Reaction, Fe Film, Diffusion, Vacancy-Type Defects

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Abstract:

The positron annihilation lifetimes and the Doppler broadening by slow positron beam are measured in thin Fe films with thickness 500 nm, a thin Hf film with thickness 100 nm, and the bilayer Fe (50 nm)/Hf (50 nm) on quartz glass substrate. We have analyzed the behavior in vacancy-type defects in each layer through some deposition temperatures and annealing. It is observed that the thin Fe film, the thin Hf film, and the bilayer Fe (50 nm)/Hf (50 nm) already contain many vacancy-type defects. We have investigated the change of densities of the vacancy-carbon complex and the small vacancy-cluster with carbons, through solid-state amorphization of Fe (50 nm)/Hf (50 nm) bilayer.

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