Device Characterisation of Short Channel Devices and its Impact on CMOS Circuit Design

Semiconductor technology has reached an end in the manufacture of conventional Metal Oxide semiconductor Field Effect Transistor (MOSFET). The continuous scaling of semiconductor devices has kept pace with Moore’s law and transistors below 1μm are grouped under deep sub-micron (DSM) technology node. But this trend seem to end beyond deep sub micron levels due to main design constraints such as short channel effects (SCE) , and variations in process design parameters leading to high leakage currents. Silicon material processes technology has undergone a change in process material and technology beyond 180nm node. For DSM technology nodes leakage current dominates the devices. Circuit designing using MOSFETs at deep sub micron levels, needs a careful study of the behaviour of short channel devices for the parameter variations such as threshold voltage, channel length leading to highleakage currents and poor performance of devices. In this paper we have presented the behaviour of NMOS metal oxide semiconductor field effect transistor (MOSFETs) for 90nm technology node in detail and finally compared with 180nm and 45nm nodes. The simulations have been carried out using libraries fromTSMC foundry and the device has been simulated using Virtuoso Cadence Spectre Simulator version 6.1.5 with HSPICE.