SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION
低能量离子束辐照磁控溅射沉积超硬质nc-TiN/nc-Cu纳米复合膜

Ti-Cu-N films containing approximately 0-10.0% Cu (atomic fraction) were synthe- sized by inductively coupled plasma assisted magnetron sputtering with two elemental targets.The effects of Cu content on film hardness and microstructure have been investigated.The addition of a small amount of Cu significantly enhanced film hardness.The Ti-Cu-N film containing 2.0%Cu has a superhard trait,with a hardness HV value of 42,which is nearly two times of that of pure TiN film.The superhard Ti-Cu-N film was characterized as a nanocomposite structure,consisting of nanocolumns of TiN crystallites with nanocrystal Cu inside the column boundaries.The hardness enhancement was attributed to nanocomposite effect.