%0 Journal Article
%T SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION<br>低能量离子束辐照磁控溅射沉积超硬质nc-TiN/nc-Cu纳米复合膜
%A LI Zhuguo
%A YU Hailiang
%A WU Yixiong
%A MIYAKE Shoji
%A <br>李铸国
%A 俞海良
%A 吴毅雄
%A 三宅正司
%J 金属学报
%D 2006
%I 
%X Ti-Cu-N films containing approximately 0-10.0% Cu (atomic fraction) were synthe- sized by inductively coupled plasma assisted magnetron sputtering with two elemental targets.The effects of Cu content on film hardness and microstructure have been investigated.The addition of a small amount of Cu significantly enhanced film hardness.The Ti-Cu-N film containing 2.0%Cu has a superhard trait,with a hardness HV value of 42,which is nearly two times of that of pure TiN film.The superhard Ti-Cu-N film was characterized as a nanocomposite structure,consisting of nanocolumns of TiN crystallites with nanocrystal Cu inside the column boundaries.The hardness enhancement was attributed to nanocomposite effect.
%K magnetron sputtering
%K ion irradiation
%K nanocomposite film
%K hardness<br>磁控溅射
%K 离子照射
%K 纳米复合膜
%K 硬度
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=073E92CFF4B48978&yid=37904DC365DD7266&vid=ECE8E54D6034F642&iid=9CF7A0430CBB2DFD&sid=3A834AEE2C42102E&eid=71EC92B56215521C&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=21