DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE
用DC—PCVD装置对钢沉积Si3N4薄膜

Si3N4 thin film has been deposited on the matrixes of carbon steels, alloy structure steels, speed steels and stainless steels by using a direct current plasma chemical vapor deposition (DC-PCVD) device under controlling processing parameters. Component,structure, morphology and hardness of the film were measured. This thin film consists mainly of the component of Si3N4 with amorphous structure.