%0 Journal Article
%T DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE<br>用DC—PCVD装置对钢沉积Si3N4薄膜
%A WU Daxing
%A YANG Chuan
%A GAO Guoqing
%A <br>吴大兴
%A 杨川
%A 高国庆
%J 金属学报
%D 1997
%I 
%X Si3N4 thin film has been deposited on the matrixes of carbon steels, alloy structure steels, speed steels and stainless steels by using a direct current plasma chemical vapor deposition (DC-PCVD) device under controlling processing parameters. Component,structure, morphology and hardness of the film were measured. This thin film consists mainly of the component of Si3N4 with amorphous structure.
%K steel
%K Si_3N_4 film
%K DC-PCVD<br>钢
%K 化学气相沉积
%K 氮化硅薄膜
%K DC－PCVD装置
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=17FA1B77429011618BE88B2CC2962403&yid=5370399DC954B911&vid=27746BCEEE58E9DC&iid=38B194292C032A66&sid=CA9ED1AB4D9E3E04&eid=90612DF06FCE4D55&journal_id=0412-1961&journal_name=金属学报&referenced_num=4&reference_num=5