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金属学报 1997
INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM
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Abstract:
Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.