%0 Journal Article
%T INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM<br>导致金刚石薄膜不均匀沉积的机理
%A HUO Xiao
%A REN Jialie
%A Lu Anli
%A <br>霍晓
%A 任家烈
%A 鹿安理
%J 金属学报
%D 1997
%I 
%X Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.
%K diamond film
%K nonuniform deposition
%K mechanism<br>金刚石薄膜
%K 不均匀沉积
%K 机理
%K MPCVD
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=17FA1B774290116151751A9B3E121F54&yid=5370399DC954B911&vid=27746BCEEE58E9DC&iid=B31275AF3241DB2D&sid=7C13E30F5EDBE7AB&eid=BBA8B1249CDAA6CE&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=5