STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION
多层膜界面粗糙度的低角X射线衍射研究

W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry.