%0 Journal Article
%T STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION<br>多层膜界面粗糙度的低角X射线衍射研究
%A WANG Fengping
%A CUI Mingqi
%A WANG Peixuan
%A FANG Zhengzhi University
%A of Science
%A Technology Beijing
%A Beijing Institute of High Energy Physics
%A Chinese Academy of Sciences
%A Beijing
%A <br>王凤平
%A 崔明启
%A 王佩璇
%A 方正知
%J 金属学报
%D 1996
%I 
%X W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry.
%K multilayer
%K low-angle X-ray diffraction
%K interface roughness
%K magnetron sputtering<br>多层膜
%K 磁控溅射
%K 低角X射线衍射
%K 粗糙度
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=1E95FD942CB6143AD64B4393FF00A8AA&yid=8A15F8B0AA0E5323&vid=9971A5E270697F23&iid=DF92D298D3FF1E6E&sid=786A9BAE5CF9B9EE&eid=0358FC3DBCE8E14D&journal_id=0412-1961&journal_name=金属学报&referenced_num=4&reference_num=2