THE INTERFACIAL ANALYSIS OF MO/SiO_2 MULTILAYERS MIRROR FOR SOFT X-RAY
Mo／SiO2软X射线多层膜反射镜的界面分析

Groups of Mo/Sio2 multilayer films were fabricated by magnetron sputter ing in Ar atmosphere. Low angle X-ray diffraction analysis of the multilayers was carried out at the diffusion scattering station of BSRF. The interfacial roughness and periodic structure are investigated through simulation of low angle X-ray diffraction spectra based on the dynamical theory. The periodic structure and composition of Mo/SiO2 multilayers were also characterized with AES. The results show that very good composition modulation struc ture formed, and no obvious diffusion of St and / or O through Mo layers is observed.