%0 Journal Article
%T THE INTERFACIAL ANALYSIS OF MO/SiO_2 MULTILAYERS MIRROR FOR SOFT X-RAY<br>Mo／SiO2软X射线多层膜反射镜的界面分析
%A WANG Fengping
%A WANG Peixuan
%A FANG Zhengzhi
%A CUI Mingqi
%A JIANG Xiaoming
%A MA Hong
%A <br>王凤平
%A 王佩璇
%A 方正知
%A 崔明启
%A 姜晓明
%A 马宏骥
%J 金属学报
%D 1997
%I 
%X Groups of Mo/Sio2 multilayer films were fabricated by magnetron sputter ing in Ar atmosphere. Low angle X-ray diffraction analysis of the multilayers was carried out at the diffusion scattering station of BSRF. The interfacial roughness and periodic structure are investigated through simulation of low angle X-ray diffraction spectra based on the dynamical theory. The periodic structure and composition of Mo/SiO2 multilayers were also characterized with AES. The results show that very good composition modulation struc ture formed, and no obvious diffusion of St and / or O through Mo layers is observed.
%K Mo/Sio2 multilayer
%K magnetron sputtering
%K interfacial roughness
%K low angle X-ray diffraction
%K AES<br>多层膜
%K 低角X射线衍射
%K 俄歇电子能谱
%K 薄膜
%K 界面
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=17FA1B7742901161EDC6E9F399E6985A&yid=5370399DC954B911&vid=27746BCEEE58E9DC&iid=DF92D298D3FF1E6E&sid=8CC50269EED5BB47&eid=6D237E9625601349&journal_id=0412-1961&journal_name=金属学报&referenced_num=1&reference_num=1