CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP
辉光放电灯中二元合金溅射率与化学组成的关系

Investigation was made of the sputtering rate in glow discharge lamp with re- lation to constituent of 25 different specimens of 6 binary systems, namely, Cr-Fe, Bi-Sb, Cu-Zn, Ag-Cu, Al-Zn and Cd-Sn, by measuring mass loss after each sputtering under con- stant Ar pressure and voltage applied. The correlation, in general, between sputtering rate and concentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic law under steady state, yet may be approximately regarded as linear only on certain special condi- tion if the two components of the alloys with similar sputtering rates.