%0 Journal Article
%T CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP<br>辉光放电灯中二元合金溅射率与化学组成的关系
%A REN Jianshi
%A ZHANG Gongshu
%A WANG Zhenshu
%A LIU Gen
%A LIU Shenglin Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A Shanghai University of Technology Correspondent senior engineer
%A Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A <br>任建世
%A 张功杼
%A 王桢枢
%A 刘根
%A 刘圣麟
%J 金属学报
%D 1992
%I 
%X Investigation was made of the sputtering rate in glow discharge lamp with re- lation to constituent of 25 different specimens of 6 binary systems, namely, Cr-Fe, Bi-Sb, Cu-Zn, Ag-Cu, Al-Zn and Cd-Sn, by measuring mass loss after each sputtering under con- stant Ar pressure and voltage applied. The correlation, in general, between sputtering rate and concentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic law under steady state, yet may be approximately regarded as linear only on certain special condi- tion if the two components of the alloys with similar sputtering rates.
%K cathode sputtering
%K glow discharge
%K binary alloy
%K sputtering rate<br>二元合金
%K 辉光放电
%K 阴极溅射
%K 溅射率
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=AC5DCEB9737224C346C0B9B931D85D8A&yid=F53A2717BDB04D52&vid=D3E34374A0D77D7F&iid=94C357A881DFC066&sid=CD775AE9DDBD7B53&eid=CFAC5CB624A41AFD&journal_id=0412-1961&journal_name=金属学报&referenced_num=1&reference_num=1